Fabrication of nonerasable gratings in SiO2 glasses by a two-beam holographic method using infrared femtosecond laser pulses

Kenichi Kawamura; Nobuhiko Sarukura; Masahiro Hirano; Hideo Hosono

doi:10.1117/12.425017

12 April 2001 Fabrication of nonerasable gratings in SiO₂ glasses by a two-beam holographic method using infrared femtosecond laser pulses

Kenichi Kawamura, Nobuhiko Sarukura, Masahiro Hirano, Hideo Hosono

Author Affiliations +

Proceedings Volume 4347, Laser-Induced Damage in Optical Materials: 2000; (2001) https://doi.org/10.1117/12.425017
Event: Laser-Induced Damage in Optical Materials: 2000, 2000, Boulder, CO, United States

Abstract

Non-erasable fine pitched grating structures were successfully encoded in amorphous SiO₂ glasses and amorphous SiO₂ thin films on silicon wafers by colliding a pair of focused pulses split from a single femtosecond pulse from a 10 Hz mode-locked Ti:sapphire laser with a regenerative amplifier (wavelength: 800 nm; pulse duration: 100 fs; pulse energy: approximately 3 mJ/pulse). This pattern was not observed for cases in which the relative time delay of the two pulses was over 0.2 ps. The encoded periodic spacing was changed by varying the angle between the two crossed pulses. A minimum periodic spacing of approximately 430 nm was achieved for a laser wavelength of 800 nm. Structural alternations of silica network induced by intense fs-laser irradiations were observed. Laser ablation processes and volume compaction in amorphous SiO₂ are origin of the formation of grating structures.

Citation Download Citation

Kenichi Kawamura, Nobuhiko Sarukura, Masahiro Hirano, and Hideo Hosono "Fabrication of nonerasable gratings in SiO₂ glasses by a two-beam holographic method using infrared femtosecond laser pulses", Proc. SPIE 4347, Laser-Induced Damage in Optical Materials: 2000, (12 April 2001); https://doi.org/10.1117/12.425017

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