Quadratic increase of nonlinear absorption in thin Al2O3 films at 193 nm

Oliver Apel; Klaus R. Mann; Gerd Marowsky

doi:10.1117/12.425028

12 April 2001 Quadratic increase of nonlinear absorption in thin Al₂O₃ films at 193 nm

Oliver Apel, Klaus R. Mann, Gerd Marowsky

Proceedings Volume 4347, Laser-Induced Damage in Optical Materials: 2000; (2001) https://doi.org/10.1117/12.425028
Event: Laser-Induced Damage in Optical Materials: 2000, 2000, Boulder, CO, United States

Abstract

Linear and nonlinear absorptance in Al2O3 films of different optical thicknesses are investigated using an ArF laser calorimeter. While the linear absorptance at 193 nm shows the linear increase expected for homogenous layers coated with identical process parameters, nonlinear absorptance increases nonlinearly with increasing film thickness. Thus, it cannot be described by a constant nonlinear absorption coefficient. The experimental findings are explained by a simple phenomenological approach using excited states with a finite interaction length longer than the actual film thickness. Due to the observed quadratical increase a new material constant is introduced which describes the nonlinear absorptance behavior correctly.

Citation Download Citation

Oliver Apel, Klaus R. Mann, and Gerd Marowsky "Quadratic increase of nonlinear absorption in thin Al₂O₃ films at 193 nm", Proc. SPIE 4347, Laser-Induced Damage in Optical Materials: 2000, (12 April 2001); https://doi.org/10.1117/12.425028

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