High-accuracy laser mask repair technology using ps UV solid state laser

Yukio Morishige

doi:10.1117/12.456808

25 February 2002 High-accuracy laser mask repair technology using ps UV solid state laser

Yukio Morishige

Proceedings Volume 4426, Second International Symposium on Laser Precision Microfabrication; (2002) https://doi.org/10.1117/12.456808
Event: Second International Symposium on Laser Precision Micromachining, 2001, Singapore, Singapore

Abstract

Laser Mask Repair System named LM700A has been developed to satisfy the increasing demands for higher accuracy with thigh throughput photomask repair system in recent semiconductor industry requirements. This paper introduces the basic configuration of the system, evaluated results for Chromium (Cr) binary masks and Molybdenum Silicide (MoSi) HalfTone (HT) phaseshift masks repairing performances, and the features of removing process using mid range (250ps) pulse duration ablation mechanism.

Citation Download Citation

Yukio Morishige "High-accuracy laser mask repair technology using ps UV solid state laser", Proc. SPIE 4426, Second International Symposium on Laser Precision Microfabrication, (25 February 2002); https://doi.org/10.1117/12.456808

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available