Laser plasma radiation sources based on a laser-irradiated gas puff target for x-ray and EUV lithography technologies

Henryk Fiedorowicz; Andrzej Bartnik; Roman Jarocki; Jerzy Kostecki; Rafal Rakowski; Miroslaw Szczurek

doi:10.1117/12.472337

1 July 2002 Laser plasma radiation sources based on a laser-irradiated gas puff target for x-ray and EUV lithography technologies

Henryk Fiedorowicz, Andrzej Bartnik, Roman Jarocki, Jerzy Kostecki, Rafal Rakowski, Miroslaw Szczurek

Author Affiliations +

Proceedings Volume 4688, Emerging Lithographic Technologies VI; (2002) https://doi.org/10.1117/12.472337
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

In this paper laser plasma radiation sources for x-ray and EUV lithography technologies are proposed. The sources are based on a recently developed double-stream gas puff target formed by pulsed injection of high-Z gas into a hollow stream of low-Z gas by using the double-nozzle setup. Strong x-ray and EUV production from the laser-irradiated double- stream gas puff target has been demonstrated. Characterization measurements of the source performed using a Nd:glass laser are presented and discussed.

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Henryk Fiedorowicz, Andrzej Bartnik, Roman Jarocki, Jerzy Kostecki, Rafal Rakowski, and Miroslaw Szczurek "Laser plasma radiation sources based on a laser-irradiated gas puff target for x-ray and EUV lithography technologies", Proc. SPIE 4688, Emerging Lithographic Technologies VI, (1 July 2002); https://doi.org/10.1117/12.472337

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