Development of mask materials for EUVL

Christine Heckle; Kenneth E. Hrdina; Bradford G. Ackerman; David W. Navan

doi:10.1117/12.467778

27 December 2002 Development of Mask Materials for EUVL

Christine Heckle, Kenneth E. Hrdina, Bradford G. Ackerman, David W. Navan

Proceedings Volume 4889, 22nd Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.467778
Event: Photomask Technology 2002, 2002, Monterey, CA, United States

Abstract

Though the Semiconductor market is soft, the technology that drives it continues to march on. Corning has supplied the semiconductor market through two generations of lithography with KrF and ArF grade HPFS Glass; the established excellence will continue with the supply of CaF₂ for 157nm and ULE Glass for 13nm. ULE Glass is a low expansion silicate glass that has historically been used for ground and spaced based telescope mirrors such as Gemini and Hubble. Industry experts have now identified ULE Glass as a material of choice for EUVL applications; but with new opportunities come new hurdles, and ULE Glass will need to be improved in order to meet the challenges of EUVL. The purpose of this presentation is to give the audience a general update of Corning's ULE Glass improvement effort for EUVL, with focus on EUV photomask requirements; it will include an overview of key ULE Glass properties, improvements that have been made, and a road map of work to be done.

Citation Download Citation

Christine Heckle, Kenneth E. Hrdina, Bradford G. Ackerman, and David W. Navan "Development of Mask Materials for EUVL", Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); https://doi.org/10.1117/12.467778

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