Patterning of thin films of TiNi deposited on silicon substrate

Vijaya Kumar Mathe; Dinesh K. Sood; Jason P. Hayes

doi:10.1117/12.471927

13 November 2002 Patterning of thin films of TiNi deposited on silicon substrate

Vijaya Kumar Mathe, Dinesh K. Sood, Jason P. Hayes

Proceedings Volume 4936, Nano- and Microtechnology: Materials, Processes, Packaging, and Systems; (2002) https://doi.org/10.1117/12.471927
Event: SPIE's International Symposium on Smart Materials, Nano-, and Micro- Smart Systems, 2002, Melbourne, Australia

Abstract

Actuators made from patterned Ti-based shape memory alloy films have potential applications in micro systems owing to their high mechanical output and other favourable characteristics. Micro fabrication techniques such as chemical etching and electrolytic photo etching have been used for patterning these alloy films. The latest trend is to use laser micromachining owing to its advantages in terms of non-contact processing, achievable resolution and pattern flexibility. Successful excimer laser micromachining of TiNi in the forms of as- rolled strips (bulk) and RF Sputter deposited, free - standing foils, with different combinations of laser parameters have been recently reported. However, sufficient data pertaining to laser micromachining of these alloy films deposited on silicon substrates are required for their applications to silicon based MEMS. We have attempted to micromachine TiNi shape memory alloy films on silicon substrate deposited by DC- magnetron sputtering using a Ti₅₄Ni₄₆ alloy target. These films were micromachined by KrF excimer laser induced ablation at 248nm. The dependence of TiNi material removal mechanisms and feature quality on laser parameters such as fluence, pulse repetition frequency and number of shots are presented.

Citation Download Citation

Vijaya Kumar Mathe, Dinesh K. Sood, and Jason P. Hayes "Patterning of thin films of TiNi deposited on silicon substrate", Proc. SPIE 4936, Nano- and Microtechnology: Materials, Processes, Packaging, and Systems, (13 November 2002); https://doi.org/10.1117/12.471927

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