Accuracy in CD-SEM metrology

Arkady V. Nikitin; Albert Sicignano; Dmitriy Y. Yeremin; Matthew Sandy; E. Tim Goldburt

doi:10.1117/12.485017

2 June 2003 Accuracy in CD-SEM metrology

Arkady V. Nikitin, Albert Sicignano, Dmitriy Y. Yeremin, Matthew Sandy, E. Tim Goldburt

Proceedings Volume 5038, Metrology, Inspection, and Process Control for Microlithography XVII; (2003) https://doi.org/10.1117/12.485017
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

Accuracy in CD-SEM metrology is divided into two discrete categories. The first category is the certification of the measuring tools' (CD-SEMs) magnification behavior. This involves magnification stability, magnificaiton linearity and magnification calibration to a certified reference. The second category is the interpretation of physical feature dimensions from their representation in the CD-SEMs digital image. To date, the algorithms used to interpret physical dimensions from CD-SEM images trace their history to image analyiss algorithms developed decades ago. This paper evaluates the currently used feature analyiss algorithms available in commercial CD-SEMs and compares their behavior to a newer approach developed by nanometrology. Measurement algorithms must be stable and not contain arbitrary free parameters. In addition, the basis for the contruct of the algorithm should be founded on an understanding of e-beam sample interactions and the resulting video signal profiles resulting from this interaction.

Citation Download Citation

Arkady V. Nikitin, Albert Sicignano, Dmitriy Y. Yeremin, Matthew Sandy, and E. Tim Goldburt "Accuracy in CD-SEM metrology", Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); https://doi.org/10.1117/12.485017

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