Evaluation of Litel's in-situ interferometer (ISI) technique for measuring projection lens aberrations: an initial study

Peter De Bisschop

doi:10.1117/12.485525

26 June 2003 Evaluation of Litel's in-situ interferometer (ISI) technique for measuring projection-lens aberrations: an initial study

Peter De Bisschop

Author Affiliations +

Proceedings Volume 5040, Optical Microlithography XVI; (2003) https://doi.org/10.1117/12.485525
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

We have set up a series of experiments to evaluate the Litel In-Situ Interferometer (ISI) for measuring projection-lens aberrations of lithographic exposure tools. The current paper describes the results we obtained so far. We believe the ISI is an excellent tool.

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Peter De Bisschop "Evaluation of Litel's in-situ interferometer (ISI) technique for measuring projection-lens aberrations: an initial study", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); https://doi.org/10.1117/12.485525

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