Scattering losses in fused silica and CaF2 for DUV applications

Stephan L. Logunov; Sergey A Kuchinsky

doi:10.1117/12.508120

26 June 2003 Scattering losses in fused silica and CaF₂ for DUV applications

Proceedings Volume 5040, Optical Microlithography XVI; (2003) https://doi.org/10.1117/12.508120
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

Scattering losses for fused silica were measured over a wide wavelength range (193-800 nm) using different laser sources. The data indicate that scattering centers are smaller than ~ 12 nm, and scattering is consistent with Rayleigh type even at 193 nm. Scattering losses scale with wavelength as 1/λ⁴, and scattering loss at 193 nm was found to be (0.65±0.08)x10^-3/ cm absorption units or (0.15±0.02)% transmission per cm. CaF₂ measurements were completed in the visible wavelength range. The experimental approach for DUV wavelength measurements for CaF₂ is described. Estimated scattering losses at 193 nm are ~0.003% transmission per cm and ~0.006% transmission per cm at 157 nm. Data for CaF₂ indicate deviation from Rayleigh-type scatter.

Citation Download Citation

Stephan L. Logunov and Sergey A Kuchinsky "Scattering losses in fused silica and CaF₂ for DUV applications", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); https://doi.org/10.1117/12.508120

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