Lithographic fabrication of microstructures by laser ablation using femtosecond laser

Yoshiki Nakata; Tatsuo Okada; Mitsuo Maeda

doi:10.1117/12.552809

2 April 2004 Lithographic fabrication of microstructures by laser ablation using femtosecond laser

Yoshiki Nakata, Tatsuo Okada, Mitsuo Maeda

Proceedings Volume 5399, Laser-Assisted Micro- and Nanotechnologies 2003; (2004) https://doi.org/10.1117/12.552809
Event: Laser-Assisted Micro- and Nanotechnologies 2003, 2003, St. Petersburg, Russian Federation

Abstract

Photo-lithographical laser ablation was demonstrated by laser ablation using a femtosecond laser system with a lithographic optical system. Among them, laser beam passed through a mask and the pattern was imaged on the film by a pair of convex lenses. As a result, the film was lithographically ablated, and micron-sized patterns were generated in a single shot. Fringes were generated outside the ablated patterns with defocusing or larger laser fluence. The resolution of generation was 13 μm, and the narrowest width of a generated line was about 4 μm. In addition, transmission gratings were used instead of a mask, and nano-sized periodic structures were generated.

Citation Download Citation

Yoshiki Nakata, Tatsuo Okada, and Mitsuo Maeda "Lithographic fabrication of microstructures by laser ablation using femtosecond laser", Proc. SPIE 5399, Laser-Assisted Micro- and Nanotechnologies 2003, (2 April 2004); https://doi.org/10.1117/12.552809

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