Disorder And Diffusion In Thin-Film Multilayers

A. M. Saxena

doi:10.1117/12.949665

6 May 1985 Disorder And Diffusion In Thin-Film Multilayers

A. M. Saxena

Proceedings Volume 0563, Applications of Thin Film Multilayered Structures to Figured X-Ray Optics; (1985) https://doi.org/10.1117/12.949665
Event: 29th Annual Technical Symposium, 1985, San Diego, United States

Abstract

Practical multilayer devices usually have some in-built imperfections that adversely affect their properties. An analysis of the diffraction properties of a multilayer, and its comparison with the results obtained from a theoretical model of a multilayer with imperfections, can give information about the type and magnitude of imperfections in the multilayer. This information can then be used to make multilayers with better characteristics.

Citation Download Citation

A. M. Saxena "Disorder And Diffusion In Thin-Film Multilayers", Proc. SPIE 0563, Applications of Thin Film Multilayered Structures to Figured X-Ray Optics, (6 May 1985); https://doi.org/10.1117/12.949665

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