Optimized inductor and low-pass filter with low substrate loss on OPS/PS interlayer

Yun Liu; Yanling Shi; Xiao Feng; Yong Wang; Shaoqiang Chen; Xiaojin Li; Ziqiang Zhu; Zongshen Lai

doi:10.1117/12.607442

8 December 2004 Optimized inductor and low-pass filter with low substrate loss on OPS/PS interlayer

Yun Liu, Yanling Shi, Xiao Feng, Yong Wang, Shaoqiang Chen, Xiaojin Li, Ziqiang Zhu, Zongshen Lai

Proceedings Volume 5774, Fifth International Conference on Thin Film Physics and Applications; (2004) https://doi.org/10.1117/12.607442
Event: Fifth International Conference on Thin Film Physics and Applications, 2004, Shanghai, China

Abstract

Oxidized porous silicon/porous silicon (OPS/PS) has been introduced as a low-loss substrate for an on-chip LC low-pass filter (LPF). The LPF is optimally designed with midband insertion loss (MIL) of -4.5dB and nominal cutoff frequency at 900MHz. The fabrication of the LPF based OPS/PS is in prevailing CMOS process. Experiments show that the performance of the LPF has been greatly improved with MIL of -4.54dB that meets the designed value quite well. And in comparison with MIL of LPF on SiO₂/Si (8Ω cm), MIL with the proposed interlayer is lowered by 8dB, which implies that the microwave loss resulting from the substrate part can be substantially suppressed by introducing OPS/PS.

Citation Download Citation

Yun Liu, Yanling Shi, Xiao Feng, Yong Wang, Shaoqiang Chen, Xiaojin Li, Ziqiang Zhu, and Zongshen Lai "Optimized inductor and low-pass filter with low substrate loss on OPS/PS interlayer", Proc. SPIE 5774, Fifth International Conference on Thin Film Physics and Applications, (8 December 2004); https://doi.org/10.1117/12.607442

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