Quartz etch process for alternating aperture phase shift masks (alt-APSM)

Sunil Srinivasan; Russ Westerman; Jason Plumhoff; Dave Johnson; Chris Constantine

doi:10.1117/12.617095

28 June 2005 Quartz etch process for alternating aperture phase shift masks (alt-APSM)

Sunil Srinivasan, Russ Westerman, Jason Plumhoff, Dave Johnson, Chris Constantine

Proceedings Volume 5853, Photomask and Next-Generation Lithography Mask Technology XII; (2005) https://doi.org/10.1117/12.617095
Event: Photomask and Next Generation Lithography Mask Technology XII, 2005, Yokohama, Japan

Abstract

The quartz dry etch is a critical step in the manufacture of Alternating Aperture Phase Shift masks (alt-APSM). In order to maintain uniform phase shift across the mask, the etch depth uniformity has to be strictly controlled. Both the radial and linear components of non-uniformity have to be minimized. The Mask Etcher IV developed at Unaxis USA reduces both the components of non-uniformity using unique hardware adjustments. Using a fluorocarbon based chemistry, etch depth variations between different feature sizes is also minimized. With good etch depth linearity, phase shift does not vary with feature size. To achieve this, etched quartz structures need to have good selectivity to resist / chrome and vertical sidewalls. Etch depth uniformity was measured using an n&k1700 RT and etch depth linearity was measured using an AFM. Etched quartz structure morphologies are observed using a SEM. After preliminary screening experiments, an optimized hardware suite and process conditions that produce good etch depth uniformity, linearity and quartz profiles with vertical sidewalls and minimum microtrenching is determined.

Citation Download Citation

Sunil Srinivasan, Russ Westerman, Jason Plumhoff, Dave Johnson, and Chris Constantine "Quartz etch process for alternating aperture phase shift masks (alt-APSM)", Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); https://doi.org/10.1117/12.617095

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available