Genetic algorithm design of reflection thin-film coatings and polarization-devices

A. R. M. Zaghloul; Y. A. Zaghloul

doi:10.1117/12.627432

5 October 2005 Genetic algorithm design of reflection thin-film coatings and polarization devices

A. R. M. Zaghloul, Y. A. Zaghloul

Proceedings Volume 5963, Advances in Optical Thin Films II; 59632E (2005) https://doi.org/10.1117/12.627432
Event: Optical Systems Design 2005, 2005, Jena, Germany

Abstract

In this communication, the design of reflection thin-film coatings and polarization-devices is achieved by the use of a recently developed fast genetic algorithm (GA). The reflection thin-film coatings, and polarization-devices, are both treated as film-substrate systems. With the required polarization-characteristics of the device as an input, the GA provides any, or all, of the design parameters at which the coating, or device, behaves as prescribed at the wavelength of operation; film and substrate materials, film thickness, and angle of incidence. The GA is real fast. It is modified to provide the required design parameters within a few cycles, literally in no time. The accuracy of the GA is high, and the GA itself is robust and consistent.

Citation Download Citation

A. R. M. Zaghloul and Y. A. Zaghloul "Genetic algorithm design of reflection thin-film coatings and polarization devices", Proc. SPIE 5963, Advances in Optical Thin Films II, 59632E (5 October 2005); https://doi.org/10.1117/12.627432

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