Paper
28 August 2006 Fabrication of dense wavelength division multiplexing filters with large useful area
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Abstract
Dense Wavelength Division Multiplexers (DWDM), a kind of narrow band-pass filter, are extremely sensitive to the optical thickness error in each composite layer. Therefore to have a large useful coating area is extreme difficult because of the uniformity problem. To enlarge the useful coating area it is necessary to improve their design and their fabrication. In this study, we discuss how the tooling factors at different positions and for different materials are related to the optical performance of the design. 100GHz DWDM filters were fabricated by E-gun evaporation with ion-assisted deposition (IAD). To improve the coating uniformity, an analysis technique called shaping tooling factor (STF) was used to analyze the deviation of the optical thickness in different materials so as to enlarge the useful coating area. Also a technique of etching the deposited layers with oxygen ions was introduced. When the above techniques were applied in the fabrication of 100 GHz DWDM filters, the uniformity was better than +/-0.002% over an area of 72 mm in diameter and better than +/-0.0006% over 20mm in diameter.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Cheng-Chung Lee, Sheng-Hui Chen, Jin-Cherng Hsu, and Chien-Cheng Kuo "Fabrication of dense wavelength division multiplexing filters with large useful area", Proc. SPIE 6286, Advances in Thin-Film Coatings for Optical Applications III, 62860E (28 August 2006); https://doi.org/10.1117/12.678915
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KEYWORDS
Dense wavelength division multiplexing

Ions

Coating

Etching

Ion beams

Optical filters

Tantalum

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