Paper
24 October 2006 Changing face of surface metrology
Author Affiliations +
Abstract
In common with most disciplines surface metrology is having to evolve in order to meet the new requirements demanded by miniaturization and the increased use of semi conductor planar technology. Changes are taking place in theory as well as in the other constituents of an engineering design such as material properties and new manufacturing processes. In this paper a number of issues will be discussed. They will be by no means a comprehensive list but sufficient will be investigated to give an idea of the nature and scope on the problem. Amongst the topics covered will be nomenclature, some mechanical properties, force balance etc. There will be a look back at the way in which surface metrology evolved to see if lessons can be learned.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
David J. Whitehouse "Changing face of surface metrology", Proc. SPIE 6357, Sixth International Symposium on Instrumentation and Control Technology: Signal Analysis, Measurement Theory, Photo-Electronic Technology, and Artificial Intelligence, 63571J (24 October 2006); https://doi.org/10.1117/12.716966
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
Metrology

Convolution

Manufacturing

Mathematics

Computing systems

Inspection

Surface finishing

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