Evaluating the performance of a 193-nm hyper-NA immersion scanner using scatterometry

Oleg Kritsun; Bruno La Fontaine; Richard Sandberg; Alden Acheta; Harry J. Levinson; Kevin Lensing; Mircea Dusa; Jan Hauschild; Anita Pici; Chandra Saravanan; Kunie Primak; Rahul Korlahalli; Srinivasan Nirmalgandhi

doi:10.1117/12.715971

26 March 2007 Evaluating the performance of a 193-nm hyper-NA immersion scanner using scatterometry

Oleg Kritsun, Bruno La Fontaine, Richard Sandberg, Alden Acheta, Harry J. Levinson, Kevin Lensing, Mircea Dusa, Jan Hauschild, Anita Pici, Chandra Saravanan, Kunie Primak, Rahul Korlahalli, Srinivasan Nirmalgandhi

Author Affiliations +

Proceedings Volume 6520, Optical Microlithography XX; 65200L (2007) https://doi.org/10.1117/12.715971
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

Scatterometry techniques are used to characterize the CD uniformity, focus and dose control, as well as the image contrast of a hyper-NA immersion lithography scanner. Results indicate very good scanner control and stability of these parameters, as well as good precision and sensitivity of the metrology techniques.

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Oleg Kritsun, Bruno La Fontaine, Richard Sandberg, Alden Acheta, Harry J. Levinson, Kevin Lensing, Mircea Dusa, Jan Hauschild, Anita Pici, Chandra Saravanan, Kunie Primak, Rahul Korlahalli, and Srinivasan Nirmalgandhi "Evaluating the performance of a 193-nm hyper-NA immersion scanner using scatterometry", Proc. SPIE 6520, Optical Microlithography XX, 65200L (26 March 2007); https://doi.org/10.1117/12.715971

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