Application of laser plasma soft x-ray and EUV sources in micro- and nanotechnology

Henryk Fiedorowicz; Andrzej Bartnik; Krzysztof Jakubczak; Roman Jarocki; Libor Juha; Jerzy Kostecki; Ladislav Pina; Rafał Rakowski; Mirosław Szczurek

doi:10.1117/12.726547

23 January 2007 Application of laser plasma soft x-ray and EUV sources in micro- and nanotechnology

Henryk Fiedorowicz, Andrzej Bartnik, Krzysztof Jakubczak, Roman Jarocki, Libor Juha, Jerzy Kostecki, Ladislav Pina, Rafał Rakowski, Mirosław Szczurek

Author Affiliations +

Proceedings Volume 6598, Laser Technology VIII: Applications of Lasers; 65980G (2007) https://doi.org/10.1117/12.726547
Event: Laser Technology VIII, 2006, Szczecin, Poland

Abstract

Results on micro- and nanoprocessing of organic polymers using X-rays and extreme ultraviolet (EUV) generated from laser-plasma radiation sources are presented in the paper. The sources used in the studies are based on the gas puff target approach developed at the Institute of Optoelectronics, Warsaw. Processing of polymers is connected with non-thermal ablation under the influence of energetic photons of X-ray and EUV radiation. The process can be useful for practical applications as it makes possible to produce structures with sub-micron spatial resolution that is not possible using the thermal ablation. The new technology will be used for production of photonic microstructures and for modification of polymer surfaces for biomedical applications.

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Henryk Fiedorowicz, Andrzej Bartnik, Krzysztof Jakubczak, Roman Jarocki, Libor Juha, Jerzy Kostecki, Ladislav Pina, Rafał Rakowski, and Mirosław Szczurek "Application of laser plasma soft x-ray and EUV sources in micro- and nanotechnology", Proc. SPIE 6598, Laser Technology VIII: Applications of Lasers, 65980G (23 January 2007); https://doi.org/10.1117/12.726547

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