Novel algorithm for modeling aberration-induced overlay in lithographic process

Fan Wang; Mingying Ma; Lifeng Duan; Xiangzhao Wang

doi:10.1117/12.782679

30 November 2007 Novel algorithm for modeling aberration-induced overlay in lithographic process

Fan Wang, Mingying Ma, Lifeng Duan, Xiangzhao Wang

Proceedings Volume 6724, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; 67240O (2007) https://doi.org/10.1117/12.782679
Event: 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 2007, Chengdu, China

Abstract

As critical dimension shrinks, overlay error induced by wavefront aberration of projection lens in lithographic tools has become a serious problem. In the present paper, we introduce a novel algorithm for modeling aberration-induced overlay in the lithographic process. The calculation results of the algorithm show good correlation with that of PROLITH, the widely used simulation program employing the vector model. And the calculating time is reduced to less than 10% with the algorithm.

Citation Download Citation

Fan Wang, Mingying Ma, Lifeng Duan, and Xiangzhao Wang "Novel algorithm for modeling aberration-induced overlay in lithographic process", Proc. SPIE 6724, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 67240O (30 November 2007); https://doi.org/10.1117/12.782679

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