Advanced OPC and 2D verification for tip engineering using aggressive illuminations

X. Zhang; T. Lukanc; H. Yang; B. Ward

doi:10.1117/12.773021

1 April 2008 Advanced OPC and 2D verification for tip engineering using aggressive illuminations

X. Zhang, T. Lukanc, H. Yang, B. Ward

Proceedings Volume 6924, Optical Microlithography XXI; 69241H (2008) https://doi.org/10.1117/12.773021
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

In this paper advanced OPC (Optical Proximity Correction) methods, additional with assistant features, and non-obvious methods were implemented to correct aberrations caused by aggressive illuminations in order to optimize the shape of the finger tips. OPC model and simulations were verified using 2D verification method.

Citation Download Citation

X. Zhang, T. Lukanc, H. Yang, and B. Ward "Advanced OPC and 2D verification for tip engineering using aggressive illuminations", Proc. SPIE 6924, Optical Microlithography XXI, 69241H (1 April 2008); https://doi.org/10.1117/12.773021

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