Paper
29 April 2008 Sub-wavelength resolution laser lithography in the field of MEMS
Author Affiliations +
Proceedings Volume 7007, INDLAS 2007: Industrial Laser Applications; 70070L (2008) https://doi.org/10.1117/12.801971
Event: INDLAS 2007: Industrial Laser Applications, 2007, Bran, Romania
Abstract
In this paper I present some techniques by which MEMS structures with sub-wavelength resolution can be obtained when using laser lithography. I concentrate on two major techniques: single photon and multi-photon absorption processes.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Gabriel Moagar-Poladian "Sub-wavelength resolution laser lithography in the field of MEMS", Proc. SPIE 7007, INDLAS 2007: Industrial Laser Applications, 70070L (29 April 2008); https://doi.org/10.1117/12.801971
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Cited by 1 scholarly publication.
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KEYWORDS
Photoresist materials

Absorption

Photons

Microelectromechanical systems

Optical lithography

Diffraction

Lithography

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