Utilization of design intent information for mask manufacturing

Kokoro Kato; Masakazu Endo; Tadao Inoue; Masaki Yamabe

doi:10.1117/12.793112

19 May 2008 Utilization of design intent information for mask manufacturing

Kokoro Kato, Masakazu Endo, Tadao Inoue, Masaki Yamabe

Proceedings Volume 7028, Photomask and Next-Generation Lithography Mask Technology XV; 702835 (2008) https://doi.org/10.1117/12.793112
Event: Photomask and NGL Mask Technology XV, 2008, Yokohama, Japan

Abstract

One of the ASET/MaskD2I target is the mask data prioritization and it effective uses for mask manufacturing issues. The MaskD2I and STARC have been working together to build efficient data flow based on the information transition from the design to the manufacturing level. By converting design level information called as "Design Intent" to the priority information of mask manufacturing data called as "Mask Data Rank (MDR)", MDP or manufacturing process based on the importance of reticle patterns is possible. Our main purpose is to build a novel data flow with the priority information of mask patterns extracted from the design intent. In this paper, we introduce the basic activities of the MaskD2I, and address the effectiveness of MDR information. Then we explain how to apply it to mask writing, inspection, MDP and MRC. We will show the new experimental results by extracted MDR from actual mask data provided by STARC.

Citation Download Citation

Kokoro Kato, Masakazu Endo, Tadao Inoue, and Masaki Yamabe "Utilization of design intent information for mask manufacturing", Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 702835 (19 May 2008); https://doi.org/10.1117/12.793112

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