Effects of thickness and substrate temperature on the electrical and optical properties of In2O3-ZnO films

Yu Pei; Fachun Lai; Limei Lin; Liqin Fan; Yan Qu; Rong Chen

doi:10.1117/12.830824

20 May 2009 Effects of thickness and substrate temperature on the electrical and optical properties of In₂O₃-ZnO films

Yu Pei, Fachun Lai, Limei Lin, Liqin Fan, Yan Qu, Rong Chen

Proceedings Volume 7282, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 728215 (2009) https://doi.org/10.1117/12.830824
Event: AOMATT 2008 - 4th International Symposium on Advanced Optical Manufacturing, 2008, Chengdu, Chengdu, China

Abstract

The influences of thickness (d) and substrate temperature (Ts) on electrical and optical properties of In₂O₃-ZnO (IZO) films are investigated. IZO films are deposited on quartz substrates by reactive direct current magnetron sputtering. The target is 80 wt.% In₂O₃ and 20 wt.% ZnO mixtures. d of the films deposited at room temperature varied from 63 to 651 nm. Ts of the films with thickness of about 200 nm varied from room temperature to 400 °C. Transmittances of the films are measured by spectrophotometer. The electrical properties such as resistivity, carrier concentration and mobility are studied by van der Pauw method. Experimental results show that the resistivity (ρ) monotonously decreases from about 1.2 × 10^-3 to 5.0 × 10^-4 Ωcm when d increases from 63 to 300 nm. As d=160 nm, the average transmittance in visible spectral region has a maximum (87%). Additionally, the average transmittances in visible spectral region for all the films deposited at different T_s are about 82%, but the transmittance in near infrared spectral region decreases with the increase of T_s. When T_s increases from 100 °C to 400 °C, ρ and mobility monotonously decrease, but carrier concentration increases.

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Yu Pei, Fachun Lai, Limei Lin, Liqin Fan, Yan Qu, and Rong Chen "Effects of thickness and substrate temperature on the electrical and optical properties of In₂O₃-ZnO films", Proc. SPIE 7282, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 728215 (20 May 2009); https://doi.org/10.1117/12.830824

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KEYWORDS

Transmittance

Visible radiation

Sputter deposition

Optical properties

Near infrared

Oxygen

Zinc oxide

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