Paper
11 May 2009 Economics of automation for the design-to-mask interface
Author Affiliations +
Abstract
Mask order automation has increased steadily over the years through a variety of individual mask customer implementations. These have been supported by customer-specific software at the mask suppliers to support the variety of customer output formats. Some customers use the SEMI P10 1 standard, some use supplier-specific formats, and some use customer-specific formats. Some customers use little automation and depend instead on close customer-supplier relationships. Implementations are varied in quality and effectiveness. A major factor which has prolonged the adoption of more advanced and effective solutions has been a lack of understanding of the economic benefits. Some customers think standardized automation mainly benefits the mask supplier in order entry automation, but this ignores a number of other significant benefits which differ dramatically for each party in the supply chain. This paper discusses the nature of those differing advantages and presents simple models suited to four business cases: integrated device manufacturers (IDM), fabless companies, foundries and mask suppliers. Examples and estimates of the financial advantages for these business types will be shown.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wesley Erck "Economics of automation for the design-to-mask interface", Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 73790U (11 May 2009); https://doi.org/10.1117/12.824271
Lens.org Logo
CITATIONS
Cited by 1 scholarly publication.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Photomasks

Semiconducting wafers

Manufacturing

Yield improvement

Prototyping

Computing systems

Error analysis

RELATED CONTENT

Strategy and tools for yield enhancement
Proceedings of SPIE (April 27 1999)
Automatic Creation of Stepper Job Files
Proceedings of SPIE (July 25 1989)
Flexible mask specifications
Proceedings of SPIE (December 27 2002)

Back to Top