Paper
28 December 2010 Error correction technology of the length grating measuring system
Xiaomei Shu, Yong Zuo, Xiaobo Xu
Author Affiliations +
Proceedings Volume 7544, Sixth International Symposium on Precision Engineering Measurements and Instrumentation; 75442G (2010) https://doi.org/10.1117/12.885868
Event: Sixth International Symposium on Precision Engineering Measurements and Instrumentation, 2010, Hangzhou, China
Abstract
The resolution of the current length grating measuring system can reach micron level, sub-micron level and nanometer level. Researching and producing the high-resolution and high-preciseness length grating measuring system is the development tendency of measuring technology, while the high-preciseness length grating measuring system also has wide application prospects. In the practical application of the grating system, the error correction technology directly affects the measurement preciseness of the length grating measuring system. Therefore, launching the research on the error correction technology of the length grating measuring system is the important. The correction method of the length grating measuring system is discussed. In the method, the displacement length is traced back to the laser wavelength via the photoelectric microscope, line scale, laser Interferometer and data-fitting tool. The error correction method of the length grating measuring system mentioned in this article is simple in principle, more convenient to be implemented, provides high correction precision, and also can be implemented in real-time automatic correction. For some instruments, based on the length grating measuring such as three-coordinate measuring machine, length measuring machine and so on, the method is of important reference and consultation value.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xiaomei Shu, Yong Zuo, and Xiaobo Xu "Error correction technology of the length grating measuring system", Proc. SPIE 7544, Sixth International Symposium on Precision Engineering Measurements and Instrumentation, 75442G (28 December 2010); https://doi.org/10.1117/12.885868
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KEYWORDS
Microscopes

Interferometers

Precision calibration

Calibration

Error analysis

Data corrections

Optical design

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