Nanophotonic fabrication in sub-nm scale

Takashi Yatsui; Motoichi Ohtsu

doi:10.1117/12.846328

26 February 2010 Nanophotonic fabrication in sub-nm scale

Takashi Yatsui, Motoichi Ohtsu

Author Affiliations +

Proceedings Volume 7586, Synthesis and Photonics of Nanoscale Materials VII; 75860D (2010) https://doi.org/10.1117/12.846328
Event: SPIE LASE, 2010, San Francisco, California, United States

Abstract

Nanophotonics, a novel optical technology, utilizes the local interaction between nanometric particles via optical near fields. The optical near fields are the elementary surface excitations on nanometric particles. Of the variety of qualitative innovations in optical technology realized by nanophotonics, this talk focuses on fabrication. A realization of an ultra-flat silica surface with angstrom-scale average roughness using noadiabatic optical near-field etching and repairing are demonstrated and its origin is discussed.

Citation Download Citation

Takashi Yatsui and Motoichi Ohtsu "Nanophotonic fabrication in sub-nm scale", Proc. SPIE 7586, Synthesis and Photonics of Nanoscale Materials VII, 75860D (26 February 2010); https://doi.org/10.1117/12.846328

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE