Influence of spatial temperature distribution on high accuracy interferometric metrology

Yongqiang Gu; Erlong Miao

doi:10.1117/12.867751

11 October 2010 Influence of spatial temperature distribution on high accuracy interferometric metrology

Yongqiang Gu, Erlong Miao

Proceedings Volume 7656, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment; 765647 (2010) https://doi.org/10.1117/12.867751
Event: 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2010, Dalian, China

Abstract

We calculate the influence of temperature change on the refractive index of air, establish a model of air temperature distribution and analyze the effect of different temperature distribution on the high accuracy interferometric metrology. First, a revised Edlen formula is employed to acquire the relation between temperature and refractive index of air, followed by introducing the fixed temperature gradient distribution among the spatial grid within the optical cavity between the reference flat and the test flat of the Fizeau interferometer, accompanied by a temperature change random function within each grid. Finally, all the rays through the air layer with different incident angles are traced by Matlab program in order to obtain the final output position, angle and OPD for each ray. The influence of different temperature distribution and the length of the optical cavity in on the testing accuracy can be analyzed through the RMS value that results from repeatable rays tracing. As a result, the horizontal distribution (vertical to optical axis) has a large effect on the testing accuracy. Thus, to realize the high accuracy figure metrology, the horizontal distribution of temperature must be rigorously controlled as well as to shorten the length of the optical cavity to a large extent. The results from our simulation are of great significant for the accuracy analysis of interferometric testing and the research of manufacturing a interferometer.

Citation Download Citation

Yongqiang Gu and Erlong Miao "Influence of spatial temperature distribution on high accuracy interferometric metrology", Proc. SPIE 7656, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 765647 (11 October 2010); https://doi.org/10.1117/12.867751

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