Paper
3 June 2010 Performance of a combined chromatic confocal microscope with thin film reflectometer
Author Affiliations +
Proceedings Volume 7729, Scanning Microscopy 2010; 77291L (2010) https://doi.org/10.1117/12.853517
Event: Scanning Microscopy 2010, 2010, Monterey, California, United States
Abstract
Chromatic confocal microscopy is a common way to interrogate topologies and is well understood. Thin film reflectometry (TFR), on the other hand, is a way to monitor film thicknesses. Semiconductor and optics producing industries, e.g., require information about topological, film thickness or optical constants. We developed a spectrometric measuring system which is capable of determining high precision thin film thickness and topographic information of a specimen at the same time. The spectral intensity distribution reflected by a transparent thin film differs from a spectroscopic confocal observation by a chromatic measurement head, since the spectral interference fringes appear in the spectra. The spectrometer-based system interrogates both confocal, as well as thin film signals employing an analytical model of the chromatic shift of the measuring head, film composition and a least-square estimator. Hence, the advantage of this combined measuring system is the concurrent determination of film thickness and distance to the measuring head. By scanning the surface of a specimen laterally, a both tomo- and topological image can be acquired. Spacial measurements at test objects were carried out to demonstrate this measurement principle and the results are discussed.
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Florian Hirth, Thorbjörn C. Buck, Natasha Steinhausen, and Alexander W. Koch "Performance of a combined chromatic confocal microscope with thin film reflectometer", Proc. SPIE 7729, Scanning Microscopy 2010, 77291L (3 June 2010); https://doi.org/10.1117/12.853517
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KEYWORDS
Colorimetry

Thin films

Confocal microscopy

Head

Reflectometry

Spectroscopy

Reflectivity

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