Hylemetry versus Biometry: a new method to certificate the lithography authenticity

Giuseppe Schirripa Spagnolo; Lorenzo Cozzella; Carla Simonetti

doi:10.1117/12.889387

6 June 2011 Hylemetry versus Biometry: a new method to certificate the lithography authenticity

Giuseppe Schirripa Spagnolo, Lorenzo Cozzella, Carla Simonetti

Proceedings Volume 8084, O3A: Optics for Arts, Architecture, and Archaeology III; 80840S (2011) https://doi.org/10.1117/12.889387
Event: SPIE Optical Metrology, 2011, Munich, Germany

Abstract

When we buy an artwork object a certificate of authenticity contain specific details about the artwork. Unfortunately, these certificates are often exchanged between similar artworks: the same document is supplied by the seller to certificate the originality. In this way the buyer will have a copy of an original certificate to attest that the "not original artwork" is an original one. A solution for this problem would be to insert a system that links together the certificate and a specific artwork. To do this it is necessary, for a single artwork, to find unique, unrepeatable, and unchangeable characteristics. In this paper we propose a new lithography certification based on the color spots distribution, which compose the lithography itself. Due to the high resolution acquisition media available today, it is possible using analysis method typical of speckle metrology. In particular, in verification phase it is only necessary acquiring the same portion of lithography, extracting the verification information, using the private key to obtain the same information from the certificate and confronting the two information using a comparison threshold. Due to the possible rotation and translation it is applied image correlation solutions, used in speckle metrology, to determine translation and rotation error and correct allow to verifying extracted and acquired images in the best situation, for granting correct originality verification.

Citation Download Citation

Giuseppe Schirripa Spagnolo, Lorenzo Cozzella, and Carla Simonetti "Hylemetry versus Biometry: a new method to certificate the lithography authenticity", Proc. SPIE 8084, O3A: Optics for Arts, Architecture, and Archaeology III, 80840S (6 June 2011); https://doi.org/10.1117/12.889387

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