Formation of PDMS films inside the holes of silica photonic crystal fibers

C. Markos; K. Vlachos; G. Kakarantzas

doi:10.1117/12.922682

25 April 2012 Formation of PDMS films inside the holes of silica photonic crystal fibers

C. Markos, K. Vlachos, G. Kakarantzas

Proceedings Volume 8426, Microstructured and Specialty Optical Fibres; 842604 (2012) https://doi.org/10.1117/12.922682
Event: SPIE Photonics Europe, 2012, Brussels, Belgium

Abstract

In this work, we demonstrate the formation of Poly-dimethylsiloxane (PDMS) films inside the holes of conventional silica photonic crystal fiber. The index guiding properties of the new PDMS-layer/Silica structures were investigated and optimized numerically using FDTD analysis. Films with thicknesses ranging from 100nm to 1μm were formed using different PDMS solution concentrations and different solution movement speeds. The thickness of films was very uniform along almost all the deposition length as indicated by Scanning Electron Microscopy (SEM) images and micro- Raman mapping.

Citation Download Citation

C. Markos, K. Vlachos, and G. Kakarantzas "Formation of PDMS films inside the holes of silica photonic crystal fibers", Proc. SPIE 8426, Microstructured and Specialty Optical Fibres, 842604 (25 April 2012); https://doi.org/10.1117/12.922682

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