Enhancing 9 nm node dense patterned defect optical inspection using polarization, angle, and focus

Bryan M. Barnes; Francois Goasmat; Martin Y. Sohn; Hui Zhou; Richard M. Silver; Abraham Arceo

doi:10.1117/12.2012250

10 April 2013 Enhancing 9 nm node dense patterned defect optical inspection using polarization, angle, and focus

Bryan M. Barnes, Francois Goasmat, Martin Y. Sohn, Hui Zhou, Richard M. Silver, Abraham Arceo

Author Affiliations +

Proceedings Volume 8681, Metrology, Inspection, and Process Control for Microlithography XXVII; 86810E (2013) https://doi.org/10.1117/12.2012250
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

To measure the new SEMATECH 9 nm node Intentional Defect Array (IDA) and subsequent small, complex defects, a methodology has been used to exploit the rich information content generated when simulating or acquiring several images of sub-wavelength-sized defects through best focus. These images, which are xy planes, collected using polarized illumination are stacked according to focus position, z, and through interpolation, volumetric pixels (“voxels”) are formed sized approximately 40 nm per side. From the image data, an intensity can be assigned to each (x,y,z) position. These four-dimensional matrices are extensively filtered for defect detection using multi-dimensional intensity thresholding, nearest-neighbor criteria, continuity requirements, and other techniques standard to optical defect inspection. A simulation example with oblique angles of illumination is presented. Experimental results are shown from the NIST λ=193 nm Microscope using full-field illumination. Volumetric data analysis is compared against the processing of single 2-D images. Defect metrics for comparing planar and volumetric data are developed with the potential shown for a five-fold increase in defect sensitivity using volumetric data versus conventional imaging.

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Bryan M. Barnes, Francois Goasmat, Martin Y. Sohn, Hui Zhou, Richard M. Silver, and Abraham Arceo "Enhancing 9 nm node dense patterned defect optical inspection using polarization, angle, and focus", Proc. SPIE 8681, Metrology, Inspection, and Process Control for Microlithography XXVII, 86810E (10 April 2013); https://doi.org/10.1117/12.2012250

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