Design and simulation of double annular illumination mode for  microlithography

Qiang Song; Jing Zhu; Baoxi Yang; Lei Liu; Jun Wang; Huijie Huang

doi:10.1117/12.2031650

23 August 2013 Design and simulation of double annular illumination mode for microlithography

Qiang Song, Jing Zhu, Baoxi Yang, Lei Liu, Jun Wang, Huijie Huang

Proceedings Volume 8911, International Symposium on Photoelectronic Detection and Imaging 2013: Micro/Nano Optical Imaging Technologies and Applications; 891105 (2013) https://doi.org/10.1117/12.2031650
Event: ISPDI 2013 - Fifth International Symposium on Photoelectronic Detection and Imaging, 2013, Beijing, China

Abstract

Methods of generating various illumination patterns remain as an attractive and important micro-optics research area for the development of resolution enhancement in advanced lithography system. In the current illumination system of lithography machine, off-axis illumination is widely used as an effective approach to enhance the resolution and increase the depth of focus (DOF). This paper proposes a novel illumination mode generation unit, which transform conventional mode to double annular shaped radial polarized (DARP) mode for improving the resolution of micro-lithography. Through LightTools^TM software simulation, double annular shaped mode is obtained from the proposed generation unit. The mathematical expressions of the radius variation of inner and outer rings are deduced. The impacts of conventional and dual concentric annular illumination pattern on critical dimension uniformity were simulated on an isolated line, square hole and corner. Lithography performance was compared between DARP illumination mode and corresponding single annular modes under critical dimension of 45nm. As a result, DARP illumination mode can improve the uniformity of aerial image at 45nm node through pitch varied in 300-500 nm to a certain extent.

Citation Download Citation

Qiang Song, Jing Zhu, Baoxi Yang, Lei Liu, Jun Wang, and Huijie Huang "Design and simulation of double annular illumination mode for microlithography", Proc. SPIE 8911, International Symposium on Photoelectronic Detection and Imaging 2013: Micro/Nano Optical Imaging Technologies and Applications, 891105 (23 August 2013); https://doi.org/10.1117/12.2031650

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KEYWORDS

Lithographic illumination

Double patterning technology

Axicons

Lithography

Polarization

Resolution enhancement technologies

Photomasks

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