Performance Of A KrF Excimer Laser Stepper

Roger W. McCleary; Paul J. Tompkins; Michael D. Dunn; Kenneth F. Walsh; John F. Conway; Ronald P. Mueller

doi:10.1117/12.968437

1 January 1988 Performance Of A KrF Excimer Laser Stepper

Roger W. McCleary, Paul J. Tompkins, Michael D. Dunn, Kenneth F. Walsh, John F. Conway, Ronald P. Mueller

Author Affiliations +

Proceedings Volume 0922, Optical/Laser Microlithography; (1988) https://doi.org/10.1117/12.968437
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

Device design criteria of half micrometer linewidths have driven optical lithography to extend its imaging wavelengths into the deep ultraviolet region. Excimer lasers are the only source that produces the high spectral brightness required by projection lenses at these wavelengths. A spectral line narrowed KrF (2484 Angstrom) excimer laser and a new illuminator have been developed and integrated with current DSW Wafer Stepper® technology. The integration of these new features require the design of control subsystems to monitor and control parameters such as wavelength and temperature. Wavelength must be tuned and stabilized to optimize the resolution and distortion performance of the reduction lens. The effects of temperature and bandwidth are also important to lens performance criteria, for example astigmatism, distortion, and contrast. Acceptance results for an excimer stepper will be discussed with special emphasis on resolution capability, illumination uniformity, focus stability, and dose repeatability.

Citation Download Citation

Roger W. McCleary, Paul J. Tompkins, Michael D. Dunn, Kenneth F. Walsh, John F. Conway, and Ronald P. Mueller "Performance Of A KrF Excimer Laser Stepper", Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); https://doi.org/10.1117/12.968437

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