A New Electron Beam/Deep Ultra Violet (EB/DUV) Cyanoacrylate Resist Technology

W M Kelly; A Doyle; E. Noonan; J Woods; J Rooney

doi:10.1117/12.945654

14 June 1988 A New Electron Beam/Deep Ultra Violet (EB/DUV) Cyanoacrylate Resist Technology

W M Kelly, A Doyle, E. Noonan, J Woods, J Rooney

Proceedings Volume 0923, Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII; (1988) https://doi.org/10.1117/12.945654
Event: Medical Imaging II, 1988, Newport Beach, CA, United States

Abstract

This paper describes a vapour coating technique for depositing polycyanoacrylate films up to 8um thick on semiconductor substrates. These films are suitable for use as EB/DUV resists and we present their measured characteristics. Vapour-deposited films have better plasma etching resistance than similar spun-on films.

Citation Download Citation

W M Kelly, A Doyle, E. Noonan, J Woods, and J Rooney "A New Electron Beam/Deep Ultra Violet (EB/DUV) Cyanoacrylate Resist Technology", Proc. SPIE 0923, Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII, (14 June 1988); https://doi.org/10.1117/12.945654

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