Finely control groove-depth variations of large-area diffraction gratings

Lixiang Wu; Keqiang Qiu; Xiaolong Jiang; Yanchang Zheng; Xiangdong Xu; Yilin Hong; Shaojun Fu

doi:10.1117/12.2077396

13 March 2015 Finely control groove-depth variations of large-area diffraction gratings

Lixiang Wu, Keqiang Qiu, Xiaolong Jiang, Yanchang Zheng, Xiangdong Xu, Yilin Hong, Shaojun Fu

Proceedings Volume 9374, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VIII; 937411 (2015) https://doi.org/10.1117/12.2077396
Event: SPIE OPTO, 2015, San Francisco, California, United States

Abstract

We proposed a technique for conducting on-the-fly fine adjustment of etch depths with sub-nanometer precision during the course of ion beam etching (IBE). Simulations were performed to evaluate the etch-depth control precision. The simulation prediction shows that the precision of fine control of etch depths is at the level of 0.1nm. The preliminary experiment was conducted. The early result and the simulation prediction are in agreement with each other, which indicates that this approach is feasible for finely controlling groove-depth variations of large-area diffraction gratings.

Citation Download Citation

Lixiang Wu, Keqiang Qiu, Xiaolong Jiang, Yanchang Zheng, Xiangdong Xu, Yilin Hong, and Shaojun Fu "Finely control groove-depth variations of large-area diffraction gratings", Proc. SPIE 9374, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VIII, 937411 (13 March 2015); https://doi.org/10.1117/12.2077396

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