Laser-induced damage threshold prediction of dielectric enhanced mirrors at 1064 nm

Jue Wang

doi:10.1117/12.2190662

22 May 2015 Laser-induced damage threshold prediction of dielectric enhanced mirrors at 1064 nm

Jue Wang

Proceedings Volume 9453, Window and Dome Technologies and Materials XIV; 94530S (2015) https://doi.org/10.1117/12.2190662
Event: SPIE Defense + Security, 2015, Baltimore, MD, United States

Abstract

HfO₂ and SiO₂ multilayers were used to enhance spectral reflectance, laser damage resistance, and environmental durability of aluminum alloy-based reflective optics. Multiband spectral reflectance was realized, ranging from ultraviolet to middle-wave infrared. Laser-induced damage threshold tests were performed at 1064 nm. Post laser damage morphology analysis was conducted, indicating defect-initiated and absorption-initiated damage mechanisms. The defect-initiated damage was associated with seeds residing at the substrate-coating interface. The absorption-initiated damage was separated from the defect-initiated damage by using an aluminum overcoat on the Al-alloy surfaces. Laser-induced damage thresholds associated with the two damage processes were predicted.

Citation Download Citation

Jue Wang "Laser-induced damage threshold prediction of dielectric enhanced mirrors at 1064 nm", Proc. SPIE 9453, Window and Dome Technologies and Materials XIV, 94530S (22 May 2015); https://doi.org/10.1117/12.2190662

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