Paper
17 January 1989 Diamond-Like Carbon Films By RF Plasma - Enhanced Chemical Vapour Deposition
R. S. Yalamanchi, G. K. M. Thutupalli
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Abstract
Diamond-like Carbon films synthesized by RF plasma-enhanced chemical vapour deposition were systematically characterized for their structural, optical and mechanical properties. The process parameters were optimized by the use of orthogonal tables to get the 'diamond-like' properties. DLC films were demonstrated to be efficient and durable antireflection coatings for IR devices. Plasma diagnostics were carried out by Langmuir probe method and Optical Emission Actionometry for Oxygen, Air and Water plasmas to give an understanding of the DLC etch mechanism.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
R. S. Yalamanchi and G. K. M. Thutupalli "Diamond-Like Carbon Films By RF Plasma - Enhanced Chemical Vapour Deposition", Proc. SPIE 0969, Diamond Optics, (17 January 1989); https://doi.org/10.1117/12.948138
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KEYWORDS
Plasma

Etching

Argon

Carbon

Diamond

Silicon

Oxygen

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