Prediction of positioning error in EB lithography

Masaki Kimura; Kazuo Goda

doi:10.1117/12.2218252

22 March 2016 Prediction of positioning error in EB lithography

Masaki Kimura, Kazuo Goda

Proceedings Volume 9777, Alternative Lithographic Technologies VIII; 977717 (2016) https://doi.org/10.1117/12.2218252
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

This paper is about positioning error of photomask by resist charge up effect in the EB lithography. We postulated that charges created by incident electron beam in the photomask form electric dipoles perpendicular to its surface by the electron image effect from metal film. The formed electric dipole distributions depending on writing patterns deflect the orbit of the electron beam . We have simulated the deflection of the electron beam by the dipole produced at the surface and obtained the dipole distribution that led to the experimentally measured position error for a test writing pattern. Our model will be useful to predict the positioning error in EB lithography.

Citation Download Citation

Masaki Kimura and Kazuo Goda "Prediction of positioning error in EB lithography", Proc. SPIE 9777, Alternative Lithographic Technologies VIII, 977717 (22 March 2016); https://doi.org/10.1117/12.2218252

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