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1 April 2022 Low fluence femtosecond laser exposure for fast 3D glass micromachining
Enrico Casamenti, Sacha Pollonghini, Yves Bellouard
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Proceedings Volume PC11991, Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XXII; PC119910J (2022) https://doi.org/10.1117/12.2612155
Event: SPIE LASE, 2022, San Francisco, California, United States
Abstract
In this study, we investigate multiple etchants and laser parameters. Interestingly, we show that there is an optimal energy dose one order of magnitude smaller than the currently used ones, and notably, at a regime where nanogratings are not yet formed. This energy dose yields higher process efficiency and lower processing time, and this, with unprecedented aspect ratio levels. We further demonstrate that for low dose exposure is the formation of laser-induced bond matrix defects in the glass matrix and not the presence of nanogratings that drives the etching selectivity.
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Enrico Casamenti, Sacha Pollonghini, and Yves Bellouard "Low fluence femtosecond laser exposure for fast 3D glass micromachining", Proc. SPIE PC11991, Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XXII, PC119910J (1 April 2022); https://doi.org/10.1117/12.2612155
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KEYWORDS
Glasses
Femtosecond phenomena
Etching
Micromachining
Laser bonding
Laser-matter interactions
Manufacturing
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