Stopping a tin ion beam with a background gas and plasma

Jack Stahl; Nathan Bartlett; David Ruzic

doi:10.1117/12.2619381

13 June 2022 Stopping a tin ion beam with a background gas and plasma

Jack Stahl, Nathan Bartlett, David Ruzic

Proceedings Volume PC12051, Optical and EUV Nanolithography XXXV; PC120510X (2022) https://doi.org/10.1117/12.2619381
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States

Conference Poster

Abstract

The attenuation of a tin ion beam was studied as it traveled through hydrogen gas and hydrogen plasma of varying pressures. The results of the experiment were compared against predicted results obtained using the collisional code RustBCA. The results of this experiment will provide greater insight into ion behavior from generation in EUV vessels to wall contamination.

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Jack Stahl, Nathan Bartlett, and David Ruzic "Stopping a tin ion beam with a background gas and plasma", Proc. SPIE PC12051, Optical and EUV Nanolithography XXXV, PC120510X (13 June 2022); https://doi.org/10.1117/12.2619381

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