Towards shot-noise-limited EUV reflectometry: in a tabletop coherent EUV microscope

Nicholas Jenkins; Michael Tanksalvala; Yuka Esashi; Henry C. Kapteyn; Margaret M. Murnane

doi:10.1117/12.2612098

13 June 2022 Towards shot-noise-limited EUV reflectometry: in a tabletop coherent EUV microscope

Nicholas Jenkins, Michael Tanksalvala, Yuka Esashi, Henry C. Kapteyn, Margaret M. Murnane

Proceedings Volume PC12053, Metrology, Inspection, and Process Control XXXVI; PC1205306 (2022) https://doi.org/10.1117/12.2612098
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States

Abstract

We implement an elegant hardware upgrade in our EUV imaging reflectometer to significantly reduce noise from beam power fluctuations. Our instrument non-destructively characterizes the composition and morphology of samples both transversely and depth-resolved, by implementing an EUV coherent diffractive imaging (CDI) microscope in a variable-angle reflection geometry. This upgrade significantly improves signal-to-noise ratio (SNR) by using an EUV beam splitter to simultaneously monitor the beam intensity before and after reflection from the sample. Fluctuations in power may then be normalized out, resulting in greatly improved SNR — an enhancement of ~6x in our first, non-optimized implementation.

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Citation Download Citation

Nicholas Jenkins, Michael Tanksalvala, Yuka Esashi, Henry C. Kapteyn, and Margaret M. Murnane "Towards shot-noise-limited EUV reflectometry: in a tabletop coherent EUV microscope", Proc. SPIE PC12053, Metrology, Inspection, and Process Control XXXVI, PC1205306 (13 June 2022); https://doi.org/10.1117/12.2612098

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KEYWORDS

Extreme ultraviolet

Reflectometry

Beam splitters

Cameras

CCD cameras

CCD image sensors

Metrology

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