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We have developed new manufacturing processes based on ion irradiation to tailor the structural properties of ultra-thin magnetic films and spintronic devices at atomic level and improve their performances. The key feature of the technology is the post-growth control at the atomic scale of structural properties and the corresponding magnetic properties. When realized through a mask this technology allows lateral modulation of magnetic properties without any physical etching. In this talk, we will show a few important results that suggest a pathway to optimize the performances of future generation of spintronic devices using ion irradiation.
Dafiné Ravelosona
"Enhancing the performances of spintronic devices at the atomic scale using ion irradiation (Conference Presentation)", Proc. SPIE PC12205, Spintronics XV, PC122050F (4 October 2022); https://doi.org/10.1117/12.2635717
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Dafiné Ravelosona, "Enhancing the performances of spintronic devices at the atomic scale using ion irradiation (Conference Presentation)," Proc. SPIE PC12205, Spintronics XV, PC122050F (4 October 2022); https://doi.org/10.1117/12.2635717