Fabrication of optical gratings on various substrate sizes and geometries by reactive ion beam etching

Philipp Böttger; Mandy Göring; Robert Metzner

doi:10.1117/12.2674212

30 April 2023 Fabrication of optical gratings on various substrate sizes and geometries by reactive ion beam etching

Philipp Böttger, Mandy Göring, Robert Metzner

Proceedings Volume PC12499, Advanced Etch Technology and Process Integration for Nanopatterning XII; PC1249907 (2023) https://doi.org/10.1117/12.2674212
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Abstract

The structuring of optical substrates gained more significance than ever before and many current and future applications challenge common production processes in respect to either grating or substrate geometry. Reactive ion beam etching (RIBE) offers the flexibility to etch blazed, binary or slanted gratings with varying dimensional parameters in flat but also curved substrates. This contribution’s focus is to demonstrate how RIBE can be adapted to various applications by tailoring the etching process or the etching tool to meet specific grating requirements.

Conference Presentation

Citation Download Citation

Philipp Böttger, Mandy Göring, and Robert Metzner "Fabrication of optical gratings on various substrate sizes and geometries by reactive ion beam etching", Proc. SPIE PC12499, Advanced Etch Technology and Process Integration for Nanopatterning XII, PC1249907 (30 April 2023); https://doi.org/10.1117/12.2674212

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