Influence of inhomogeneities on the reflectance and optical efficiency of MO/SI multilayers for EUV mask blanks

Antonio Checco; Katrina Rook; Mohammad Saghayezhian; Kenji Yamamoto; Meng H. Lee; Ashish Kulkarni

doi:10.1117/12.2687750

22 November 2023 Influence of inhomogeneities on the reflectance and optical efficiency of MO/SI multilayers for EUV mask blanks

Antonio Checco, Katrina Rook, Mohammad Saghayezhian, Kenji Yamamoto, Meng H. Lee, Ashish Kulkarni

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Proceedings Volume PC12751, Photomask Technology 2023; PC127510D (2023) https://doi.org/10.1117/12.2687750
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Abstract

Ion beam deposition (IBD) is the process-of-record for fabricating Mo/Si multilayers (MLs) for EUV mask blanks. This process affords outstanding ML performance in terms of defectivity, central wavelength control, and reflectivity. However, the above parameters are strongly dependent on physical and chemical inhomogeneities of the deposited MLs. Here we study systematically the effect of film purity, density, thickness uniformity, and interfacial roughness/intermixing, on the reflectance and imaging performance of Mo/Si MLs. Structural and spectral characteristics of ML are investigated experimentally, and the results compared to optical simulations. These findings may benefit the design and optimization of Mo/Si MLs with tailored spectral characteristics.

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Antonio Checco, Katrina Rook, Mohammad Saghayezhian, Kenji Yamamoto, Meng H. Lee, and Ashish Kulkarni "Influence of inhomogeneities on the reflectance and optical efficiency of MO/SI multilayers for EUV mask blanks", Proc. SPIE PC12751, Photomask Technology 2023, PC127510D (22 November 2023); https://doi.org/10.1117/12.2687750

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KEYWORDS

Extreme ultraviolet

Inhomogeneities

Multilayers

Reflectivity

EUV optics

Design and modelling

Film thickness

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