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10 April 2024 Advanced Optical Control through Atomic Layer Surface Engineering
Maksym Plakhotnyuk, Masoud Akbari, Simone Santucci, Mira Baraket, Ivan Kundrata
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Proceedings Volume PC12956, Novel Patterning Technologies 2024; PC129560R (2024) https://doi.org/10.1117/12.3012989
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States
Abstract
This abstract delves into the evolution and impact of film deposition techniques within the optics and optoelectronics sector, particularly highlighting Spatial Atomic Layer Deposition (SALD) and ATLANT 3D's innovative microreactor Direct Atomic Layer Processing (µDALP™) technology. It discusses how SALD and µDALP™ overcome the limitations of traditional methods by providing precise control over film thickness and composition at an atomic level. Emphasizing µDALP™'s capability for accurate, localized thin film deposition, it explores its role in creating advanced optical components with enhanced performance. Additionally, the abstract touches upon the versatility of Atomic Layer Deposition (ALD) for various optical materials, underscoring the potential of µDALP™ in fabricating high-quality optical films for diverse applications, promising significant advancements in optical technology and industry applications.
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(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.
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Maksym Plakhotnyuk, Masoud Akbari, Simone Santucci, Mira Baraket, and Ivan Kundrata "Advanced Optical Control through Atomic Layer Surface Engineering", Proc. SPIE PC12956, Novel Patterning Technologies 2024, PC129560R (10 April 2024); https://doi.org/10.1117/12.3012989
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KEYWORDS
Atomic layer deposition
Optical surfaces
Engineering
Chemical vapor deposition
Control systems
Film thickness
Optical coatings
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