Study of pattern placement error by thermal expansions in nanoimprint lithography

Yifang Chen; Jiarui Tao; Xing-Zhong Zhao; Zheng Cui

doi:10.1117/1.2172991

1 January 2006 Study of pattern placement error by thermal expansions in nanoimprint lithography

Yifang Chen, Jiarui Tao, Xing-Zhong Zhao, Zheng Cui

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 5, Issue 1, 011002 (January 2006). https://doi.org/10.1117/1.2172991

Abstract

Pattern placement error (or pattern distortion) caused by different thermal expansions between templates and substrates in nanoimprint lithography is experimentally investigated. Using fabricated nanorulers, placement errors are quantitatively measured. Our results prove that nanoimprint lithography (NIL) with a heat cycle does have considerable error of pattern placement. But that is not the case with imprints at room temperature. This indicates that low-temperature or room-temperature imprints should be effective solutions.

©(2006) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Yifang Chen, Jiarui Tao, Xing-Zhong Zhao, and Zheng Cui "Study of pattern placement error by thermal expansions in nanoimprint lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 5(1), 011002 (1 January 2006). https://doi.org/10.1117/1.2172991

Published: 1 January 2006

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