Volume 23 Issue 2 | Journal of Micro/Nanopatterning, Materials, and Metrology

Journal of Micro/Nanopatterning, Materials, and Metrology

VOL. 23 · NO. 2 | April 2024

ISSUES IN PROGRESS

IN PROGRESS

SPIE publishes accepted journal articles as soon as they are approved for publication. Journal issues are considered In Progress until all articles for an issue have been published. Articles published ahead of the completed issue are fully citable.

IN THIS ISSUE

News and Commentary (1)

Special Section on Curvilinear Masks, Part 2 (1)

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News and Commentary

Pushing the boundaries of patterning: a conversation with Tatiana Kovalevich

Harry Levinson

Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 02, 020701, (April 2024) https://doi.org/10.1117/1.JMM.23.2.020701

Open Access

Video Abstract Content

TOPICS: Optical lithography, Printing

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Special Section on Curvilinear Masks, Part 2

Qualification of structured curvilinear ILT assist features for production

Yuri Granik

Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 02, 021302, (March 2024) https://doi.org/10.1117/1.JMM.23.2.021302

TOPICS: SRAF, Lithography, Optical proximity correction, Printing, Photomasks, Manufacturing, Photovoltaics, Design, Extreme ultraviolet, Convolution

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