Organometallic carboxylate resists for extreme ultraviolet with high sensitivity

James Passarelli; Michael Murphy; Ryan Del Re; Miriam M. Sortland; Jodi Hotalen; Levi Dousharm; Roberto Fallica; Yasin Ekinci; Mark Neisser; Daniel A. Freedman; Robert L. Brainard

doi:10.1117/1.JMM.14.4.043503

14 October 2015 Organometallic carboxylate resists for extreme ultraviolet with high sensitivity

James Passarelli, Michael Murphy, Ryan Del Re, Miriam M. Sortland, Jodi Hotalen, Levi Dousharm, Roberto Fallica, Yasin Ekinci, Mark Neisser, Daniel A. Freedman, Robert L. Brainard

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 14, Issue 4, 043503 (October 2015). https://doi.org/10.1117/1.JMM.14.4.043503

Abstract

We have developed organometallic carboxylate compounds [R_nM(O₂CR′)₂] capable of acting as negative-tone extreme ultraviolet (EUV) resists. The most sensitive of these resists contain antimony, three R-groups and two carboxylate groups, and carboxylate groups with polymerizable olefins (e.g., acrylate, methacrylate, or styrenecarboxylate). Evidence suggests that high sensitivity is achieved through the polymerization of olefins in the exposed region. We have performed a systematic sensitivity study of the molecules of the type R_nM(O₂CR′)₂ where we have studied seven R groups, four main group metals (M), and three polymerizable carboxylate groups (O₂CR′). The sensitivity of these resists was evaluated using E_max or dose to maximum resist thickness after exposure and development. We found that the greatest predictor of sensitivity of the R_nSb(O₂CR′)₂ resists is their level of polymerizable olefins. We mathematically define the polymerizable olefin loading (POL) as the ratio of the number of olefins versus the number of nonhydrogen atoms. Linear and log plots of E_max versus POL for a variety of molecules of the type R₃Sb(O₂CR′)₂ lend insight into the behavior of these resists.

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James Passarelli, Michael Murphy, Ryan Del Re, Miriam M. Sortland, Jodi Hotalen, Levi Dousharm, Roberto Fallica, Yasin Ekinci, Mark Neisser, Daniel A. Freedman, and Robert L. Brainard "Organometallic carboxylate resists for extreme ultraviolet with high sensitivity," Journal of Micro/Nanolithography, MEMS, and MOEMS 14(4), 043503 (14 October 2015). https://doi.org/10.1117/1.JMM.14.4.043503

Published: 14 October 2015

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