Large area gratings by x-ray LIGA dynamic exposure for x-ray phase-contrast imaging

Tobias J. Schröter; Frieder Koch; Pascal Meyer; Martin Baumann; Daniel Münch; Danays Kunka; Sabine Engelhardt; Marcus Zuber; Tilo Baumbach; Jürgen Mohr

doi:10.1117/1.JMM.16.1.013501

12 January 2017 Large area gratings by x-ray LIGA dynamic exposure for x-ray phase-contrast imaging

Tobias J. Schröter, Frieder Koch, Pascal Meyer, Martin Baumann, Daniel Münch, Danays Kunka, Sabine Engelhardt, Marcus Zuber, Tilo Baumbach, Jürgen Mohr

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 16, Issue 1, 013501 (January 2017). https://doi.org/10.1117/1.JMM.16.1.013501

Abstract

X-ray differential phase-contrast imaging (DPCI) using a Talbot–Lau interferometer at a conventional tube source has continuously found applications since its first demonstration. It requires high aspect ratio grating structures with a feature size in the micrometer range that are fabricated using lithographie, galvanik und abformung technology. To overcome the current limitation in grating area, an exposure strategy—continuous exposure—has been developed. In this case, the mask is fixed in respect to the synchrotron beam and only the substrate is scanned. Thus, the grating area is given by the scanning length which is much larger than the actual mask size. The design, needs, and tolerances to adopt this process of dynamic exposure will be described. Furthermore, the first tests using this method will be presented. Gratings with a metal aspect ratio of 11 and a period of 10 μm were fabricated on an area of 165 mm×65 mm. First imaging results demonstrate the suitability of this method. No differences in the visibility or in x-ray image compared to gratings fabricated by the standard method could be found.

Citation Download Citation

Tobias J. Schröter, Frieder Koch, Pascal Meyer, Martin Baumann, Daniel Münch, Danays Kunka, Sabine Engelhardt, Marcus Zuber, Tilo Baumbach, and Jürgen Mohr "Large area gratings by x-ray LIGA dynamic exposure for x-ray phase-contrast imaging," Journal of Micro/Nanolithography, MEMS, and MOEMS 16(1), 013501 (12 January 2017). https://doi.org/10.1117/1.JMM.16.1.013501

Received: 3 November 2016; Accepted: 22 December 2016; Published: 12 January 2017

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available