Layered Synthetic Microstructure X-Ray Mirror Focusing Instrument: Bent Silicon Wafer Substrate

J. A. Penkethman

doi:10.1117/12.7976652

1 February 1988 Layered Synthetic Microstructure X-Ray Mirror Focusing Instrument: Bent Silicon Wafer Substrate

J. A. Penkethman

Author Affiliations +

Optical Engineering, Vol. 27, Issue 2, 270299 (February 1988). https://doi.org/10.1117/12.7976652

Abstract

The use of layered synthetic microstructures (LSMs) in a diagnostic instrument for focusing x rays from advanced magnetic fusion energy plasmas has been proposed. This paper describes a single-channel prototype of an eventual 20-channel instrument. LSMs are deposited on eight silicon wafer substrates, which provide bendable x-ray mirrors. Each mirror is bent in a four-bar device, and each is subsequently aligned to approximate an off-axis portion of a paraboloid at whose focus is placed a silicon surface barrier detector. The x-ray flux-collecting function of a single channel, together with the low resolution characteristics of the LSM passband and the plasma source geometry, allows for an easily obtained silicon wafer surface figure accuracy. This paper also describes the bending of the LSM mirrors and the installation and alignment of the prototype.

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J. A. Penkethman "Layered Synthetic Microstructure X-Ray Mirror Focusing Instrument: Bent Silicon Wafer Substrate," Optical Engineering 27(2), 270299 (1 February 1988). https://doi.org/10.1117/12.7976652

Published: 1 February 1988

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